Basics of Doping

IMPORTANT

Basics of Doping: Overview

This topic covers concepts, such as, Doping and Dopant, Doping, Dopant, Process of Doping & Extrinsic Semiconductor etc.

Important Questions on Basics of Doping

MEDIUM
IMPORTANT

A silicon specimen is made into a p-type semiconductor by doping, on an average, one indium atom per 5×107 silicon atoms. If the number density of atoms in the silicon specimen is 5×1028 atoms m-3, then the number of acceptor atoms in silicon per cubic centimeter will be

EASY
IMPORTANT

Doping a semiconductor results in

 

EASY
IMPORTANT

Which of the following is an extrinsic semiconductor?

EASY
IMPORTANT

If Np and Ne be the numbers of holes and conduction electrons in an extrinsic semiconductor, then :-

HARD
IMPORTANT

The number of silicon atoms per m3 is 5×1033. This is doped simultaneously with 5×1022 atoms per m3 of Arsenic and 5×1020 per m3 atoms of indium. Calculate the number of electrons and holes. Given that n=1.5×1016 m3. Is the material n-type or p-type?

EASY
IMPORTANT

Which group elements can be used to dope with Si/Ge to get a P-type semiconductor.

EASY
IMPORTANT

Would there be any advantage in adding n-type or p-type impurities to copper

EASY
IMPORTANT

Assertion: In n-type semiconductor electrons in conduction band is more than holes in valance band.

Reason: Only electrons are produced when pentavalent impurity is added to pure semiconductor.